Magnetic Polishing Pad Systems

The Kemet magnetic disc system is suitable for Kemet's range of magnetic polishing pads, diamond grinding and fine grinding discs, and any magnetic consumable from other suppliers. Available in 200mm, 250mm and 300mm diameter. Other sizes available upon request

Greatly extended cloth life - up to 4 x longer compared to self adhesive pads
Easier to change cloths
No adhesive breakdown problems
No more finger cutting - no risk to cut fingertips
Adaptable to any process
Fits to any magnetic plate
Cleaner process

magnetic polishing pad system

10 Pack	Diameter (mm)
Pad Type	200	250	300
ASFL-M	341175	341176	341177
AST-M	341287	341288	341285
Chem-HM	341851	341852	341853
Kan-K	341294	341295	341072
MRE-M	341815	341816	341817
PSU-MM	341811	341812	341813
NSH-BM	341263	341261	341262
Lil Plus-M	341289	341290	341291
NLH-M	341292	341293	341267

Magnetic Disc

Diameter (mm)
200	250	300
345770	345771	345772

ASFL-M

Synthetic silk pad with durable woven structure for mirror finishing of most metals. Commonly used with 3 Micron Diamond compound or finer.

AST-M

Extra hard synthetic silk pad on rigid backing. Used for increased cutting action and good general flatness control. Used with 14 Microndiamond compound and coarser.

Chem-HM

For use with a chemical mechanical polishing process with Col-K colloidal silicoca suspension

Kan-M

Woven wool polishing cloth for polishing ferrous and non ferrous metals. Use with 3 Micron diamond compound.

MRE-M

Synthetic flock sprayed onto a flexible waterprooof carrier. Use with 6 micron diamond compound or finer.

PSU-MM

Non woven chemo textile pad suitable for general polishing. Use with 3 Micron diamond compound.

NSH-BM

A short nap with woven backing. Use with 3 Micron diamond compound or finer.

Lil Plus-M

A soft short nap cloth suitable for mirror finishing. Use with 3 micron diamond compound.

NLH-M

A longer stiff nap cloth. Used with 6 Micron diamond compound or finer.